What is cryogenic plasma etching?
Cryogenic etching operates at extremely low substrate temperatures (typically below −100°C). This temperature renders a chemical self-passivation on the sidewall, which is volatile at room temperature, enabling smooth, damage-free sidewalls without polymer residuals after processing. Click here to learn more about plasma etching processes.
What is inductively coupled plasma reactive ion etching (ICP-RIE)?
Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) represents the next generation of plasma etching technology. It separates plasma generation and ion acceleration into two independently controlled systems: Inductively coupled RF coil – generates a high-density plasma Bias power source – controls ion energy at the substrate This dual control enables deeper etching, improved anisotropy, and […]
What is reactive ion etching (RIE)?
Reactive Ion Etching (RIE) combines chemical etching with physical ion bombardment to deliver precise pattern transfer. In RIE systems, a plasma is generated between two electrodes using a radio frequency (RF) power source. Reactive species chemically react with the substrate surface while positive ions accelerate toward it, physically sputtering atoms away. Learn more about plasma […]
Which plasma processes can I combine in one chamber?
SENTECH provides process modules that combine multiple processes, such as SIPAR for PECVD and PEALD, in a single reactor. The SI 500 ICP-RIE accommodates chlorine and fluorine-based etch chemistry in one process chamber. These configurations come with dedicated hardware, cleaning and conditioning recipes, as well as training. These solutions prioritise a smaller footprint and cost […]
Does SENTECH offer technical service support?
Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.
What is ICP-RIE?
Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) represents the next generation of plasma etching technology. It separates plasma generation and ion acceleration into two independently controlled systems: Inductively coupled RF coil – generates a high-density plasma Bias power source – controls ion energy at the substrate This dual control enables deeper etching, improved anisotropy, and […]
Can I send my samples to SENTECH for analysis?
Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.
Does SENTECH offer application support?
SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or […]
Can you deliver SENTECH Ellipsometry Systems internationally?
SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.
Can you deliver systems SENTECH Plasma Systems internationally?
SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here