Explore how our highly versatile, and robust plasma process technology systems combine multiple SENTECH process module technologies to deliver repeatability, high yield, and high throughput for your plasma etch and deposition processes.
The flexible and modular nature of the SENTECH low-damage etch systems makes them suitable for a wide range of applications. Learn how our tools can help you achieve high aspect ratio etch processes even at low plasma power.
Discover how our versatile and durable low-damage deposition systems deliver outstanding properties of deposited dielectric films, even at low temperatures.
Learn how you can precisely control layer thickness during process cycles to achieve excellent low non-uniformity and highly conformal deposition of ultra-thin films on 3D structures using our specialist ALD and PEALD tools.
Explore how our highly versatile, and robust cluster configurations combine multiple SENTECH process module technologies to deliver repeatability, high yield, and high throughput for your plasma etch and deposition proceses.
