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Plasma Process Technology
Plasma Process Technology
Low-damage plasma etch and deposition systems from SENTECH
Plasma Etching
ICPECVD Systems
Atomic Layer Deposition Systems
Cluster Configuration for Plasma Etching and Deposition
Thin Film Metrology
Thin Film Metrology
SENTECH thin film metrology tools for repeatable and accurate results
Metrology for Quality Control
Spectroscopic Ellipsometry
Spectroscopic Reflectometry
Laser Ellipsometry
In-situ Metrology / Endpoint Detection
Application and Industries
Application and Industries
Leading-edge application capabilities from SENTECH
Optoelectronics
Micro-electromechanical systems (MEMS) Applications
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Stand-alone, tabletop film thickness probe
Spectral range: 430 nm…930 nm (typ.)
Film thickness range: up to 25 000 nm
Optical fibre bundle
Optional PC
