In-situ Metrology / Endpoint Detection

Find the best tools in in-situ monitoring for process controlled and fast, efficient, process development and optimisation.

SENresearch 4.0 In-Situ Spectroscopic Ellipsometer

The SENTECH SENresearch 4.0 in-situ spectroscopic ellipsometers (SER 801 and SER 801 DUV) are measurement tools to monitor etching and deposition processes with a high spectral resolution to generate endpoints or to characterise layers.

SE 401adv In-Situ Laser Ellipsometer

In-situ sub-angstrom precision measurement of ultra-thin, single-layer films.

Al Real Time Monitor Laser Ellipsometer

The SENTECH AL Real Time Monitor is a proven optical diagnostic tool allowing fast process development with ultra-high resolution of single ALD and ALE cycles.

SLI Laser-Based Interferometric EPD

The SENTECH SLI Laser Interferometer for process monitoring and endpoint detection is the perfect partner for in-situ optical metrology with the SENTECH plasma etch and deposition range of systems.