SI 500 ICP-RIE System
The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) source with low ion energy for low-damage etch and nanostructuring.
Sensors
Sensors Sensors are devices that detect and measure physical properties or changes in the environment and convert them into electrical signals. These properties can include light, temperature, pressure, humidity, motion, and more. Detection speed, efficiency, and small size make these devices highly suitable for use in many leading-edge and growing industrial applications. SENTECH systems and […]
Cluster Configuration for Plasma Etching and Deposition
SENTECH Cluster Tools comprise plasma etching and / or deposition modules, transfer chamber and vacuum load lock or cassette station for flexibiliy in wafer handling.