Does SENTECH offer technical service support?
Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.
Can I send my samples to SENTECH for analysis?
Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.
Does SENTECH offer application support?
SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or […]
Can you deliver SENTECH Ellipsometry Systems internationally?
SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.
SENTECH Metrology System Overview Brochure
Field upgradable accessories
Mapping Turntable for anisotropic samples 2C for full Mueller matrix measurement Video based auto-align Microspots Liquid cells Heating and cooling stage Transmission holder
Options
Manual goniometer Motorised Pyramid Goniometer In situ, in line, and desktop Reflectometer
Spectral ranges
DUV – VIS 190 – 1,000 nm 240 – 1,000 nm NIR with Diode-Array 190 – 1,700 nm 240 – 1,700 nm NIR with FTIR 190 – 2,500 nm 190 – 3,500 nm 240 – 2,500 nm 240 – 3,500 nm
SENresearch 4.0 In-Situ Spectroscopic Ellipsometer
The SENTECH SENresearch 4.0 in-situ spectroscopic ellipsometers (SER 801 and SER 801 DUV) are measurement tools to monitor etching and deposition processes with a high spectral resolution to generate endpoints or to characterise layers.