SI 500 ICP-RIE System
The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) source with low ion energy for low-damage etch and nanostructuring.
Power Devices
Power devices RF and power device technology is emerging as the future of power converters and systems industries and integrated devices, and 5G implementation. These devices have the advantage of being able to precisely control electrical energy from the source to the load according to the load demand, at high efficiency, and with outstanding reliability. […]
Cluster Configuration for Plasma Etching and Deposition
SENTECH Cluster Tools comprise plasma etching and / or deposition modules, transfer chamber and vacuum load lock or cassette station for flexibiliy in wafer handling.