SI 500 ICP-RIE System
The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) source with low ion energy for low-damage etch and nanostructuring.
SI 500 D ICPECVD System
Inductively coupled (IC) PECVD system, the SENTECH SI 500 D for high density, low ion energy, and low-pressure plasma deposition of dielectric films and low-damage, low-temperature deposition for passivation layers.
Optoelectronics
Optoelectronics Optoelectronics is a fast-emerging technology field that consists of applying electronic devices to sourcing, detecting, and optical properties and control of light. Applications include VCSELs, micro-LEDs, and microlenses, all of which have a growing demand in a large number of industrial end-users, including aerospace, space, automotive, consumer electronics, information technology, and healthcare. Industries: Aerospace […]
Cluster Configuration for Plasma Etching and Deposition
SENTECH Cluster Tools comprise plasma etching and / or deposition modules, transfer chamber and vacuum load lock or cassette station for flexibiliy in wafer handling.