SI 500 ICP-RIE System
The SENTECH SI 500 ICP-RIE high-end plasma etch system uses an inductively coupled plasma (ICP) source with low ion energy for low-damage etch and nanostructuring.
MEMS
Micro-electromechanical systems (MEMS) Micro-electromechanical systems or MEMS is the umbrella term for many microfabricated devices that enable highly scalable, cost-efficient, mass-produced sensors, actuators, and optics. MEMS have many applications and are often found in for example pressure sensors, acceleration sensors, and microphones due to their extremely high sensitivity, small size, and very low power consumption […]
Cluster Configuration for Plasma Etching and Deposition
SENTECH Cluster Tools comprise plasma etching and / or deposition modules, transfer chamber and vacuum load lock or cassette station for flexibiliy in wafer handling.