SENresearch 4.0 In-Situ Spectroscopic Ellipsometer

The SENTECH SENresearch 4.0 in-situ spectroscopic ellipsometers (SER 801 and SER 801 DUV) are measurement tools to monitor etching and deposition processes with a high spectral resolution to generate endpoints or to characterise layers.
SENresearch 4.0 Spectroscopic Ellipsometer

The SENresearch 4.0 spectroscopic ellipsometer covers the widest spectral range from 190 nm (deep UV) to 3,500 nm (NIR). High spectral resolution is offered to analyse even thick films up to 200 µm thickness using FTIR ellipsometry.
SENpro Cost-Effective Spectroscopic Ellipsometer

The SENpro is a cost-effective spectroscopic ellipsometer without compromising advanced measurement performance.
SENDIRA Infrared Spectroscopic Ellipsometer with FTIR

The spectroscopic ellipsometer SENDIRA measures thin film thickness, refractive index, extinction coefficient, and related properties of bulk materials, single layers, and multi-layer stacks.
SpectraRay/4 Spectroscopic Ellipsometry Software

The proprietary SpectraRay/4 SENTECH Spectroscopic Ellipsometry Software, includes data acquisition, modeling, fitting, and extended reporting of ellipsometric, reflection, and transmission data.
SLI Laser-Based Interferometric EPD

The SENTECH SLI Laser Interferometer for process monitoring and endpoint detection is the perfect partner for in-situ optical metrology with the SENTECH plasma etch and deposition range of systems.
SI 500 CCP RIE System with He Back Side Cooling

A conductively coupled plasma etch tool with Helium back side cooling for processing of substrates in RIE mode.
SI 591 compact RIE Plasma System

The SENTECH SI 591 compact RIE Plasma Etch system with load lock is a compact solution for chlorine and fluorine-based RIE.
Etchlab 200 RIE Open Lid Plasma System

The RIE plasma etching system Etchlab 200 features the benefits of cost-effective direct loading.
SI 500 C Cryogenic ICP-RIE System

Cryogenic etching using the SI 500 C represents the leading edge for inductively coupled plasma (ICP) processing