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SLI Laser-Based Interferometric EPD

The SENTECH SLI Laser Interferometer for process monitoring and endpoint detection is the perfect partner for in-situ optical metrology with the SENTECH plasma etch and deposition range of systems.

Dekoratives Bild
Dekoratives Bild

Key features & benefits

Automated laser endpoint detection for etching and deposition processes

In-situ measurements using the SENTECH SLI Laser Interferometer are particularly suitable for monitoring the endpoint detection for transparent layers, endpoint detection for interfaces of transparent layers and endpoint detection for etching opaque films and stopping on an interface.

Multi-layer mode sequential endpoint recipes

Multi-endpoint recipes include multiple conditions for EPDs, which are executed sequentially thus enabling a change of plasma process parameters during a multi-layer etch process, according to individual film properties.

Fully integrated endpoint detection with The SENTECH operating Software SIA

The SENTECH SLI Laser Interferometer can be fully integrated with the SENTECH operating software, SIA, for specific endpoint detection recipes that directly parameterise endpoint monitoring by using easy, industry-standard command lines.

SLI

The SENTECH SLI laser interferometer endpoint monitor for the plasma systems of SENTECH Instruments works with a focused beam of coherent laser light. The laser beam passes through the top viewport of the plasma system and is reflected by the sample. The reflected light hits the detector and the intensity is measured.

Flexibility and modularity

The SENTECH SLI Laser Interferometer in-situ optical metrology endpoint monitor that can be used with the entire range of SENTECH plasma etch and deposition processing systems, works with a focused beam of coherent laser light passing through the top viewport of the plasma system and is then reflected by the sample to accurately measure intensity.

A separate illumination (LED) and a CCD camera are used for the observation of the sample and adjustment of the laser spot. The whole endpoint monitor is moved by an automatic x y-stage allowing easy spot adjustment using the SENTECH SIA operating software system.

Automated in-situ measurements using the SENTECH SLI Laser Interferometer are ideal for monitoring the layer thickness while etching or growing a transparent layer or layered structures.

SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.

SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or contact the team.

Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.

Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.

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