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SE 401adv In-Situ Laser Ellipsometer

In-situ sub-angstrom precision measurement of ultra-thin, single-layer films.

Key features & benefits

Sub-Angstrom accuracy

The stabilised HeNe laser guarantees a precision of 0.1 Å for thin film thickness measurement of ultra-thin single layers.

High speed

The SENTECH SE 401adv laser ellipsometer for in-situ measurement speed enables users to monitor single film growth and endpoint detection or to map samples for homogeneity.

High stability and reproducibility of the measured ellipsometric angles

The SE 401adv laser ellipsometer for in-situ measurement, allows monitoring growth and etch processes in different ambientes at the surface of reflecting samples. It measures the time dependence of the ellipsometric angles Ψ and Δ and calculates in real-time thickness and refractive index

SE 401adv is adaptable to your needs by mapping up to 200 mm, liquid cells for in situ measurement, video camera, autofocus, simulation software, and certified standard wafer.

Flexibility and modularity

The SENTECH SE 401adv in-situ laser ellipsometer can be utilised to characterise single films and substrates from selectable, application-specific angles of incidence. The auto-collimating telescope ensures precise measurement on most absorbing or transparent substrates with a flat, reflective surface. The fully integrated support of multiple angle measurements (40 ° – 90 ° in steps of 5 °) can be used for determining the thickness, refractive index, and extinction coefficient of layer stacks.

The SENTECH SE 401adv is the laser ellipsometer for thickness measurement of ultra-thin single films. The options of the SENTECH SE 401adv in-situ laser ellipsometer support applications in microelectronics, photovoltaics, data storage, display technology, life science, metal processing, and many more leading-edge technologies.

The SENTECH SE 401adv is adaptable to your needs by mapping up to 200 mm, liquid cells for in situ measurement, video camera, autofocus, simulation software, and certified standard wafer.

Find out more about why the SENTECH SI 400adv multiple angle laser ellipsometer is also the right choice for ex-situ use.

Configurations

SE 400adv

Table top equipment
HeNe-laser for high stability and reproducibility
Highly precise sample alignment
Manual goniometer with superior performance and angle accuracy

SE 401adv

In-situ laser ellipsometer with a time resolution of 40 ms.
HeNe-laser for high stability and reproducibility
Kit for easily mounting the sender and receiver modules to the flanges of a process chamber

FAQ | Can you deliver SENTECH Ellipsometry Systems internationally?

SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.

FAQ | Does SENTECH offer application support?

SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or contact the team.

FAQ | Can I send my samples to SENTECH for analysis?

Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.

FAQ | Does SENTECH offer technical service support?

Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.