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SE 500adv Combined Ellipsometry Reflectometry

The SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films.

Dekoratives Bild
Dekoratives Bild

Key features & benefits

Unambiguous thickness determination

The combination of ellipsometry and reflectometry allows for fast and unambiguous determination of the thickness of transparent films by automatic identification of the cyclic thickness period.

Largest measurement range

The combination of laser ellipsometer and reflectometry extends the thickness range for transparent films up to 25 µm or more depending on the photometer option chosen.

Push the limits of laser ellipsometry

The multiple-angle manual goniometer with superior performance and angle accuracy enables the measurement of refractive index, extinction coefficient, and film thickness of single films and layer stacks.

SENTECH SE 500adv

The SENTECH SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring the layer thickness of transparent films. It extends the measurable thickness to 25 µm. Therefore, the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv, especially for analysing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.

The options of the SE 500adv support applications in many industries:

  • Microelectronics
  • Microsystems technology
  • Photovoltaics
  • Display technology
  • Chemistry

Flexibility and modularity

The SENTECH SE 500adv can be operated as a laser ellipsometer, as a film thickness probe, and as a CER ellipsometer. Consequently, it offers maximum flexibility never reached by standard laser ellipsometers. Operated as an ellipsometer, single and multiple-angle measurements can be performed. When operated as a film thickness probe, the thickness of a transparent or weakly absorbing film is measured under normal incidence.

The combination of ellipsometry and reflectometry (CER) in the SE 500adv comprises the ellipsometer optics, goniometer, combined reflection measurement head and auto-collimating telescope, sample platform, HeNe laser source, laser light detection unit, and photometer.

 

Customise your tool

Options

  • Mapping up to 200 mm,
  • Liquid cells for in situ measurement,
  • Video camera,
  • Autofocus,
  • Motorised goniometer,
  • SpectraRay 4.0 simulation software,
  • Certified standard wafer

SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.

SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or contact the team.

Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.

Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.

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