The SENTECH AL Real Time Monitor is a proven optical diagnostic tool allowing fast process development with ultra-high resolution of single ALD and ALE cycles.
Atomic layer processes are quickly and easily developed and optimised using single atomic layer deposition (ALD) or atomic layer etching (ALE) cycles. The SENTECH AL Real Time Monitor reveals adsorption and desorption with ultra-high, 40 ms time resolution. Development time of processes, substrates, precursors, and gasses are saved.
ALD processing becomes more efficient after optimisation with the SENTECH AL Real Time Monitor. Precursor and processing time are saved.
When the precursor supply is running out, this is immediately indicated by a change in growth per cycle detected by the SENTECH AL Real Time Monitor.
The SENTECH AL Real Time Monitor for fast process development is a proven, optical diagnostic tool, allowing ultra-high resolution of single ALD and ALE cycles. The main applications of the SENTECH AL Realtime Monitor are analysis of film properties (growth rate, thickness, refractive index, as well as etch rate) without breaking vacuum, developing new processes in a short time, and studying reaction mechanisms during ALD and ALE cycles in real-time.
The innovative SENTECH AL Real Time Monitor is specially designed for fast and efficient process development and optimisation with SENTECH PEALD and ALD systems.
One software enables easy operation of SENTECH PEALD systems, SENTECH ALE systems, and SENTECH AL Real Time Monitor.
A large material library for optical constants supports the development of new processes and can be extended by ex-situ characterisation.
The SENTECH AL Real Time Monitor is fully integrated into the SENTECH SIA operating software, ensuring easy operation.
SENTECH has an international network of distributors and technical service experts. We deliver globally, including Europe, Asia, Africa, North and South America. For more details on in-country representation, click here.
SENTECH has a large team of application experts for both plasma process technology and thin film metrology. At our campus are two laboratories which are used to process and characterise customer samples, for system demonstrations and customer training. SENTECH offers application support for the lifecycle of your system. Learn more about our application support or contact the team.
Yes, SENTECH has two application labs in-house. You can contact our application team, who will share with you all the details and provide a sample analysis form for you to complete. Click here for further information and contact details.
Yes, SENTECH has a large network of technical service experts who offer in-country support for both plasma process technology and thin film metrology systems. Remote or on-site support is possible depending on your requirements. Click here to find out more or to contact the team.
