SENTECH is attending PESM 2026
Grenoble, France, 08 – 09 June 2026
PESM 2026 is devoted to plasma etch and strip processes for micro, nano, and biotechnologies. This workshop provides a forum for open discussions between science and technology for scientists, process engineers, PhD students and industrial partners in the field of dry etching, including plasma processing and other vacuum-based removal techniques such as ion beam, neutral beam, and gaseous thermal etching. This year´s event will focus on plasma etching and cleaning challenges for semiconductors & memory applications and quantum applications.
If you are planning to visit this conference, we would be happy to connect. We look forward to meeting you!
To find out more about the event or to register, click here.
