Designed with a modular plasma configuration, the system allows operation with the True Remote CCP source or the PTSA ICP source, depending on user process requirements.
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Plasma Process Technology
Plasma Process Technology
Low-damage plasma etch and deposition systems from SENTECH
Thin Film Metrology
Thin Film Metrology
SENTECH thin film metrology tools for repeatable and accurate results
- Application and Industries
Application and Industries
Leading-edge application capabilities from SENTECH
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Company
About SENTECH, news and events
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- Customer Support
Customer Support
SENTECH Sales, Application and Technical Service support