Applications span an extensive range of film thicknesses, from ultra-thin 1 nm semiconductor and microelectronic layers such as SiO, SiN, graphene, and MoS₂, to photovoltaic materials including a-Si:H, perovskites, and TCOs. Spectroscopic ellipsometry can also characterise thicker films up to 15 μm, such as photoresist, nitride, and oxide layers (e.g., ZnO).