SI 591 cluster
Configurations of up to 6-port transfer chamber available Combination of RIE, ICP-RIE, PECVD, and ALD Manual vacuum load lock or cassette station Cluster for R & D and high throughput SENTECH control software
SI 591 reverse
RIE plasma etch with a small footprint Load lock for through-the-wall integration Halogen and fluorine chemistry For up to 200 mm wafers Diagnostic windows for laser interferometer and OES
SI 591 compact
RIE plasma etching with small footprint Load lock Corrosive and non-corrosive chemistry For up to 200 mm wafers Diagnostic windows for laser interferometer and OES
SI 591 compact RIE Plasma System
The SENTECH SI 591 compact RIE Plasma Etch system with load lock is a compact solution for chlorine and fluorine-based RIE.