Etchlab 200
RIE plasma etch system Open lid For up to 200 mm wafers Diagnostic windows for laser interferometer and OES
Etchlab 380
RIE plasma etcher Open lid For up to 300 mm wafers Diagnostic windows for laser interferometer and OES
Etchlab 200 RIE Open Lid Plasma System
The RIE plasma etching system Etchlab 200 features the benefits of cost-effective direct loading.