Plasma Source
Designed with a modular plasma configuration, the system allows operation with the True Remote CCP source or the PTSA ICP source, depending on user process requirements.
Cluster Configuration
PEALD module is compatible for 3 to 6 port cluster configurations Can combine with ICPECVD, ALE and ICP-RIE modules
SI PEALD Plasma-Enhanced Atomic Layer Deposition System
The SENTECH SI PEALD enables homogenous and conformal coating of sensitive substrates and layers at low temperatures. A high flux of reactive gas species is provided at the sample surface without UV radiation or ion bombardment.