In-situ Metrology / Endpoint Detection

Find the best tools in in-situ monitoring for process controlled and fast, efficient, process development and optimisation.

AL Real Time Monitor

The SENTECH AL Real Time Monitor is a proven optical diagnostic tool allowing fast process development with ultra-high resolution of single ALD and ALE cycles.

Laser Ellipsometer for in-situ measurement – SE 401adv

In-situ sub-angstrom precision measurement of ultra-thin, single-layer films.

Laser-based interferometric EPD – SLI

The SENTECH SLI Laser Interferometer for process monitoring and endpoint detection is the perfect partner for in-situ optical metrology with the SENTECH plasma etch and deposition range of systems.

SENresearch 4.0 for in-situ measurement – Spectroscopic Ellipsometers

The SENTECH SENresearch 4.0 in-situ spectroscopic ellipsometers (SER 801 and SER 801 DUV) are measurement tools to monitor etching and deposition processes with a high spectral resolution to generate endpoints or to characterise layers.

Contact us and request a quote

Explore SENTECH products and applications

Spectroscopic Ellipsometry

Laser Ellipsometery

Spectroscopic Reflectometry

Metrology for quality control

News

Wafer-level integration challenges of ALD for 2D materials

Find out about the collaboration between SENTECH and the Ruhr-Universität Bochum (RUB).

Analysing the earth’s heat balance to better understand global warming

The European Space Agency's satellite mission planned for 2027.

The SENTECH “Plasma Process Technology Seminar” 2024

Click here to find out more about the SENTECH Plasma Process Technology Seminar.

The SENTECH Thin Film Metrology Seminar and Workshop

Read the full article to find out more about the seminar.

SENTECH set to expand sales and service offerings in Spain

Welcome to the SENTECH team Izasa Scientific