Atomic Layer Deposition Systems

Find the best Atomic Layer Deposition System providing excellent uniformity and conformity for ultra-thin pinhole and particle-free films even down to just a few nanometers.

Precise thickness control and uniformity

PEALD System with True Remote CCP Source – SI PEALD

The SENTECH True Remote CCP Source enables homogenous and conformal coating of sensitive substrates and layers at low temperatures. A high flux of reactive gas species is provided at the sample surface without UV radiation or ion bombardment.

PEALD System for Optical Coatings on Large Substrates – SILAYO

The SENTECH SILAYO is a plasma-enhanced atomic layer deposition (PEALD) system for optical coatings and extends the SENTECH PECVD and ALD product portfolio.

AL Real Time Monitor

The SENTECH AL Real Time Monitor is a proven optical diagnostic tool allowing fast process development with ultra-high resolution of single ALD and ALE cycles.

Plasma Process Technology

Plasma
Etching

PECVD
Systems

Cluster
Configuration

News

Wafer-level integration challenges of ALD for 2D materials

Find out about the collaboration between SENTECH and the Ruhr-Universität Bochum (RUB).

Analysing the earth’s heat balance to better understand global warming

The European Space Agency's satellite mission planned for 2027.

The SENTECH “Plasma Process Technology Seminar” 2024

Click here to find out more about the SENTECH Plasma Process Technology Seminar.

The SENTECH Thin Film Metrology Seminar and Workshop

Read the full article to find out more about the seminar.

SENTECH set to expand sales and service offerings in Spain

Welcome to the SENTECH team Izasa Scientific